Mentor: Xuemei May Cheng
Sample Fabrication and Optimization
Nanostructured materials are materials with one or more dimensions at nanoscale (10-7-10-9 meters). This research focuses on magnetic properties of nanomaterials and their possible applications in digital storage and sensors. In the semiconductor industry nanostructures are routinely fabricated. Photolithorgraphy is considered to be a top-down approach in sample fabrication methods. Typical photolithographic process consists of a mask carrying the requisite pattern information and subsequently transferring that pattern. By applying photoresist to silicon wafers and using Mask Aligner we are able to grow patterns on samples in UV light exposure. Application of Spin Coater with different parameters during photoresist leads to different thickness of the pattern. The thickness of pattern which this research focuses on ranges from 500 nm to 550 nm ideally. Experiments are conducted by changing the parameters including number of round per minute spin time, exposure time and development time. Atomic Force Microscope(AFM) is also used to see the pore size and uniformity of pattern in nanoscale and measure the thickness of the pattern.